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2009.09
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Effect of N2O/SiH4 flow ratios on properties of amorphous silicon oxide thin films deposited by inductively-coupled plasma chemical vapor deposition with application to silicon surface passivation
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Effect_of_N2O.pdf
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ÀÌÀü±Û |
Journal of The Electrochemical Society
ICDL
 
2010/09/07
´ÙÀ½±Û |
Journal of The Electrochemical Society
ICDL
 
2010/09/07
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