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Date
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35 Japanese Journal of Applied Physics 2009.06 Hydrogenated Amorphous Silicon Layer Formation by Inductively Coupled Plasma Chemical Vapor Deposition and Its Application for Surface Passivation of p-Type Crystalline Silicon
34 Applied Surface Science 2009.05 Raman scattering analysis of the residual stress in metal-induced crystallized amorphous silicon thin films using nickel
33 Thin Solid Films 2009.05 Fabrication of polycrystalline silicon thin films on glass substrates using fiber laser crystallization
32 Thin Solid Films 2009.05 Comparative study of electro-physical properties of heterostructures containing PECVD nanocrystalline and anodic porous silicon layers
31 Journal of the Korean Physical Society 2009.04 Memory Characteristics of MNNOS Capacitors with Various Energy Band Gaps of Silicon Nitride
30 Taylor & Francis Group, LLC 2009.03 Nonvolatile Poly-silicon Memory Device with Oxide-Nitride-Oxynitride Stack Structure on Glass for Flat Panel Display
29 MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY 2009.03 Black surface structures for crystalline silicon solar cells
28 Solar Energy Materials & Solar Cells 2009.01 Optimization of fabrication process of high-efficiency and low-cost crystalline silicon solar cell for industrial applications
27 Journal of the Korean Physical Society 2008.12 Electrical Properties of Organic Light-emitting Diodes Fabricated on HfOX-treated Indium-tin-oxide surfaces by using an Impedance Spectroscopy Analysis
26 Journal of Nanoscience and nanotechnology 2008.12 Effect of Needle-Like Silicon Nanosurface on the Charge Storage Characteristics of Silicon Nanocrystals Embedded Within Silicon Nitride Matrix
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