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N 학술대회명 발행년도 논문제목 PDF
42 ICAMD2007 2007.12
Investigate on the Charge Storage Capability of Silicon for SIO2/SI/SiOxNy  Structure Memory on Glass Formed by ICP-CVD
41 ICAMD2007 2007.12
Fabrication and Characterization of TFT using ozone/TEOS process at Low Temperature for application to Non-Volatile Memory on Glass
40 ICAMD2007 2007.12
Aluminum Oxide Thin Films as Top Blocking Layer by using RF Sputtering for Non Volatile Memory
39 EU PVSEC 2010.09
Impedance Spectroscopic Analysis for the p/I interface inder Different Dopoing Concentration in Solar cell
38 ENGE2010 2010.11
Effect of carrier injection stress in boron doped amorphous silicon oxide films and thin film solar cells
37 ENGE2010 2010.11
The quality analysis on amorphous and micrycrystalline silicon thin films by spectroscopy ellipsometry
36 ENGE2010 2010.11
Ultra large grain effect of thin film transistors compare to eximer laser annealing methods
35 EMRS2008 2008.05
Characteristics of Charge Storage and Trap Sites of Silicon Nitride films for Nonvolatile Memory
34 EMRS2008 2008.05
Memory characteristics of SiNX/a-Si /SiON fabricated on glass by ICP-CVD
33 EMRS2008 2008.05
Electrical Properties of Low Temperature Polysilicon TFT  by Using APCVD with TEOS/Ozone
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