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N 학술대회명 발행년도 논문제목 PDF
22 DPS 2008 2008.11
Electrical characteristics of low temperature poly-Si thin film transistors using lightly doped drain (LDD) structure
21 DPS 2008 2008.11
Optical and Electrical Characteristics of Ultra-thin Silicon Oxynitride Films Deposited by Plasma-Assisted Oxynitridation
20 ECS prime 2008 2008.10
Properties of Grown Silicon Films by LPCVD and Their Characterization Study for TFT Applications
19 ECS prime 2008 2008.10
The characteristics of Al/SiNX/a-Si /SiON/Si Structure using a-Si Thin Films as a Charge Trap Layer
18 IMID 2008 2008.10
Nonvolatile Memory Devices with Oxide-nitride-oxynitride Stack Structure for System on Panel of Mobile Flat Panel Display
17 IMID 2008 2008.10
Effect of HfOX treatment on ITO surface of organic light emitting diodes using Impedance spectroscopy analysis
16 ISPSA2008 2008.08
Surface passivation properties of SiOx and SiNx by PECVD for application of silicon Solar cell
15 ICMAP2008 2008.08
The Characteristics of MINOS Structure using Cerium Oxide Thin Films as a Top Blocking Layer
14 ICMAP2008 2008.08
Crystallization of Amorphous Silicon thin films using a Ni Solution
13 ICMAP2008 2008.08
A study of a-SiOx:H as a passivation layer on p-type silicon using Inductively Coupled Plasma(ICP)-CVD system
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