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N 학술대회명 발행년도 논문제목 PDF
12 ICMAP2008 2008.08
Memory characteristics of NNN-MIS using various silicon-nitride band gap
11 EMRS2008 2008.05
Characterization and Properties of Grown Silicon Films by LPCVD for TFT Application
10 EMRS2008 2008.05
Aluminum Oxide Thin Films as type of Top Blocking Layer by using RF sputtering for Non Volatile Memory
9 EMRS2008 2008.05
Fabrication of Non-Volatile Memory Devices on Glass using Al2O3 Thin Films as a Top Blocking Layer
8 EMRS2008 2008.05
Electrical Properties of Low Temperature Polysilicon TFT  by Using APCVD with TEOS/Ozone
7 EMRS2008 2008.05
Memory characteristics of SiNX/a-Si /SiON fabricated on glass by ICP-CVD
6 EMRS2008 2008.05
Characteristics of Charge Storage and Trap Sites of Silicon Nitride films for Nonvolatile Memory
5 ICAMD2007 2007.12
Aluminum Oxide Thin Films as Top Blocking Layer by using RF Sputtering for Non Volatile Memory
4 ICAMD2007 2007.12
Fabrication and Characterization of TFT using ozone/TEOS process at Low Temperature for application to Non-Volatile Memory on Glass
3 ICAMD2007 2007.12
Investigate on the Charge Storage Capability of Silicon for SIO2/SI/SiOxNy  Structure Memory on Glass Formed by ICP-CVD
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