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[2019.04] Effects of post deposition annealing atmosphere on interfacial and electrical properties of HfO2/Ge3N4 gate stacks
작성자: 관리자 조회: 1445 등록일: 2022-03-21
 
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  이전글  [2019.04] High-Efficiency Photo-Generated Charges of ZnO/TiO2 Heterojunction Thin Films for Photocatalytic and Antibacterial Performance
  다음글  [2019.04] Damage to passivation contact in silicon heterojunction solar cells by ITO sputtering under various plasma excitation modes
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