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[2012.08] Enhancement of electrical stability of a-IGZO TFTs by improving the surface morphology and packing density of active channel
작성자: 관리자 조회: 1283 등록일: 2022-03-18
 
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  이전글  [2012.08] Novel vapor texturing method for EFG silicon solar cell applications
  다음글  [2012.07] Selective emitter using a screen printed etch barrier in crystalline silicon solar cell
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118 [2012.03] Optimal indium tin oxide layer as anti reflection coating for crystalline silicon solar ce... 관리자 1308 2022-03-14
117 [2012.08] Novel vapor texturing method for EFG silicon solar cell applications 관리자 1307 2022-03-18
116 [2012.01] Stability of SiN X/SiN X double stack antireflection coating for single crystalline silico... 관리자 1306 2022-03-14
115 [2012.04] Operation mechanism of Schottky barrier nonvolatile memory with high conductivity InGaZnO ... 관리자 1306 2022-03-14
114 [2013.02] Negative gate-bias temperature stability of N-doped InGaZnO active-layer thin-film transis... 관리자 1306 2022-03-18
113 [2012.02] Doping-Free Fabrication of Silicon Thin Films for Schottky Solar Cell 관리자 1305 2022-03-14
112 [2013.02] Improvement of memory window and retention with low trap density in hydrogenated-amorphous... 관리자 1304 2022-03-18
111 [2013.10] Si-rich SiNx rear passivated c-Si solar cell with a novel antimony Local Back Surface Fiel... 관리자 1304 2022-03-18
110 [2015.10] Advanced Passivation Technology and Loss Factor Minimization for High Efficiency Solar Cel... 관리자 1304 2022-03-21
109 [2015.02] Effect of thermal annealing on the optical and electrical properties of boron doped a-SiOx... 관리자 1302 2022-03-21
108 [2012.04] Effect of carrier injection stress in thin film solar cells by impedance spectroscopy 관리자 1301 2022-03-14
107 [2015.02] Laser Fired Local Back Contact C-Si Solar Cells Using Phosphoric Acid for Back Surface Fie... 관리자 1301 2022-03-21
106 [2014.03] Improvement of haze ratio of DC (direct current)-sputtered ZnO:Al thin films through HF (h... 관리자 1300 2022-03-18
105 [2012.04] Study on the ITO work function and hole injection barrier at the interface of ITO/a-Si: H ... 관리자 1299 2022-03-14
104 [2023.03] In-situ PECVD-based stoichiometric SiO2 layer for semiconductor devices 관리자 1299 2023-12-18
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