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[2023.03] Initial Nucleation Approach for Large Grain-Size and High-Quality Microcrystalline Silicon Active Layer in Thin Film Transistors
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  ÀÌÀü±Û  [2023.03] Superhydrophobic Surface on Insulators by Using Perfluoropolyether-Functionalized Silica Nanostructures for Preventing Stress Corrosion Cracking at the Pin–Cement Junction
  ´ÙÀ½±Û  [2023.03] In-situ PECVD-based stoichiometric SiO2 layer for semiconductor devices
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