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[2020.07] Effect of IGZO thin films fabricated by Pulsed-DC and RF sputtering on TFT characteristics
ÀÛ¼ºÀÚ: °ü¸®ÀÚ Á¶È¸: 1632 µî·ÏÀÏ: 2022-03-21
 
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  ÀÌÀü±Û  [2020.07] Comparative study of aluminum and nickel contact electrodes for indium–tin–zinc oxide thin film transistors using oxygen vacancy diffusion model
  ´ÙÀ½±Û  [2020.07] Analysis of passivation property using thin Al2O3 layer and simulation for realization of high-efficiency TOPCon cell
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328 [2020.09] Analysis of Contact Reaction Phenomenon between Aluminum–Silver and p+ Diffused Laye... °ü¸®ÀÚ 1642 2022-03-21
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326 [2020.08] Optical Properties of CaF2 Thin Film Deposited on Borosilicate Glass and Its Electrical Pe... °ü¸®ÀÚ 1634 2022-03-21
¢Ñ [2020.07] Effect of IGZO thin films fabricated by Pulsed-DC and RF sputtering on TFT characteristics... °ü¸®ÀÚ 1633 2022-03-21
324 [2020.08] Optimization of MIS type Non-Volatile Memory Device with Al-Doped HfO2 as Charge Trapping ... °ü¸®ÀÚ 1631 2022-03-21
323 [2020.11] Analysis of Negative Bias Illumination Stress Induced Effect on LTPS and a-IGZO TFT °ü¸®ÀÚ 1628 2022-03-21
322 [2020.06] Influence of the Carrier Selective Front Contact Layer and Defect State of a-Si:H/c-Si Int... °ü¸®ÀÚ 1613 2022-03-21
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317 [2019.12] High Haze Ratio-Based ITO Films Prepared on Periodic Textured Glass Surfaces for Thin Film... °ü¸®ÀÚ 1609 2022-03-21
316 [2020.04] Development of Equipment and Application of Machine Learning Techniques Using Frequency Re... °ü¸®ÀÚ 1602 2022-03-21
315 [2020.06] ITO: Zr bi-layers deposited by reactive O2 and Ar plasma with high work function for silic... °ü¸®ÀÚ 1601 2022-03-21
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